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Water diffusion and fracture behavior in nano-porous low-k dielectric film stacks

Submitted by Li Han on
Among various low-dielectric constant low-k materials under development, organosilicate glasses
OSGs containing nanometer-size pores are leading candidates for use as intrametal dielectrics in
future microelectronics technologies. In this paper, we investigate the direct impact of water
diffusion on the fracture behavior of film stacks that contain porous OSG coatings. We demonstrate
that exposure of the film stacks to water causes significant degradation of the interfacial adhesion

State-of-the-art understanding of cracking for porous materials?

Submitted by Al Zappor on

It seems there are quite a few experimental studies [1,2] on the fracture properties of porous materials, like nanoporous low-k dielectrics, as a function of porosity. Can anyone point out some references on the theoretical part, like the available models, computational methods or analytical approaches that can capture microstructure information, including porosity, pore geometry etc. Interface delamination of porous materials is also of interest. Thanks.

North American Workshop on Applications of the Physics of Porous Media

Submitted by MichelleLOyen on

The 7th North American Workshop on Applications of the Physics of Porous Media will be held in Puerto Vallarta, Mexico, November 2-6, 2007. This will be the 7th biennial meeting of researchers around the world who are interested in the phenomena associated with physics of fluid flow and deformation in porous media and its applications to a broad range of basic roblems encountered in geophysics, geomechanics, medical physics, and condensed matter physics.

Full details are available at the website: