August Workshop on Materials Characterization for Nanoscale Reliability

We invite you to participate in the upcoming Workshop on Materials Characterization for Nanoscale Reliability, to take place 14-16 August, 2007 at the University of Colorado in Boulder, Colorado. Details are posted at http://www.boulder.nist.gov/div853/Nanoscale_Reliability_workshop/index.htm.

The purpose of the workshop is to bring together recognized experts in a wide variety of fields, representing the multidisciplinary nature of nanoscience, to discuss MATERIALS CHARACTERIZATION and MODELING ISSUES of critical importance to ASSESSING and IMPROVING the MECHANICAL RELIABILITY of extremely fine-scale materials. One goal of the workshop is the creation of a roadmap for nanoscale characterization and modeling techniques for the next 5 to 10 years.

The workshop will feature about 8 plenary talks. Confirmed speakers to date include:

Greg Blackman, DuPont
Anne Dillon, National Renewable Energy Laboratory
George Fitzgerald, Accelrys
Dave Larsen, Imago
George Pharr, Oak Ridge National Laboratory
George Thompson, Intel
Ed Webb, Sandia National Laboratories

Attendees are invited to: present a very brief oral summary of their research on nanomaterial characterization and/or modeling, highlighting its relevance to the design and fabrication of reliable nanomaterials and nanostructures; display a poster on their research; and participate in panel discussions led by the plenary speakers.

The organizing committee includes:
Robert Keller, National Institute of Standards and Technology
David Read, National Institute of Standards and Technology
Martin Dunn, University of Colorado
Richard Vinci, Lehigh University

The workshop is sponsored by the National Institute of Standards and Technology (NIST), the University of Colorado, and the National Science Foundation.

Please contact Dave Read (read@boulder.nist.gov) to reserve a spot as soon as you are able to forecast your attendance. Participation will be limited to ensure a good environment for discussion.