I did some preliminary study on free-standing self-assembled monolayer (only 1 nm thick). Bulge test was used to determine the elasticity and residual stress in the membrane. I just took the model from Prof. Vlassak's paper (J mater. Res 7,1992,3242). Althought the model could explain the data very well.

But I still have some doubts. After annealing in UHV, the membrane was changed from an amorphous to a nanocrystalline carbon network, at the same time, the membrane was changed from an insulating state to a conducting state. The Young's modulus increase from 10 GPa to 48 Gpa after annealed at 1000 K. I don't really understand whether the model is valid for a polymer-like membrane (with cross-linking network) and a nanocrystalline membrane (with nanosized graphene network)after annealing treatment. Could someone give me some suggestions?

The paper can be found in the following link: http://www3.interscience.wiley.com/search/allsearch?mode=quicksearch&products=journal&WISsearch2=1521-4095&WISindexid2=issn&contentTitle=Advanced+Materials&contextLink=blah&contentOID=10008336&WISsearch1=one+nanometer&WISindexid1=WIStitle&articleGo.x=19&articleGo.y=8

One Nanometer Thin Carbon Nanosheets with Tunable Conductivity and Stiffness

Advanced Materials

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