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 <title>iMechanica - A review on Chip-Package Interaction and Its Impact on Reliability of Cu/low k Interconnects - Comments</title>
 <link>http://www.imechanica.org/node/2587</link>
 <description>Comments for &quot;A review on Chip-Package Interaction and Its Impact on Reliability of Cu/low k Interconnects&quot;</description>
 <language>en</language>
<item>
 <title>A review on Chip-Package Interaction and Its Impact on Reliability of Cu/low k Interconnects</title>
 <link>http://www.imechanica.org/node/2587</link>
 <description>&lt;p&gt;
&lt;strong&gt;Abstract:&amp;nbsp;&lt;/strong&gt;
&lt;/p&gt;
&lt;p&gt;
&lt;span&gt;Chip-packaging interaction is becoming a critical reliability issue for Cu/low k chips during assembly into a plastic flip-chip package. In a flip-chip package, the thermal deformation of the package can be directly coupled into the Cu/low k interconnect structure inducing large driving forces for interfacial crack formation. This chapter summarizes the experimental and modeling studies to investigate the chip-package interaction and its impact on low k interconnect reliability. First, the packaging induced deformation and stress at the chip level is analyzed using high-resolution moir&amp;eacute; interferometry and compared to thermal and process-induced stresses during chip fabrication. Then, results from 3D finite element analysis (FEA) based on a multilevel sub-modeling approach to investigate the chip-package interaction for low k interconnects is presented. Packaging induced crack driving forces for relevant interfaces in Cu/low k structures are deduced and compared with corresponding interfaces in Cu/TEOS structures. Effects due to the solder, underfill and low k material properties on packaging reliability are examined. Finally, the effects of interconnect scaling and multilevel stacking on chip-package interaction and their impact on low k interconnect reliability is discussed.&lt;/span&gt;
&lt;/p&gt;
&lt;p&gt;
&amp;nbsp;
&lt;/p&gt;
&lt;p&gt;
&lt;strong&gt;Outline:&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;1. Introduction&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;2. Experimental Techniques&lt;/span&gt;&lt;/strong&gt;
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&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;2.1 Thermal deformation of plastic flip-chip package&lt;/span&gt;
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&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;2.2 Measurement of interfacial fracture toughness&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;3. Mechanics of Cohesive and Interfacial Fracture in Thin Films&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;3.1 Channel cracking&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;3.2 Interfacial delamination&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;4. Modeling of Chip-Packaging Interactions&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;4.1. Multilevel sub-modeling technique&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;4.2 Modified virtual crack closure (MVCC) method&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;4.3 Package level deformation&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;4.4 Energy release rate for stand-alone chips&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;5. Energy Release Rate under Chip-Package Interactions&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;5.1 Effect of low k dielectrics&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;5.2 Effect of solder materials and die attach process&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;span&gt;5.3 Effect of low k material properties&lt;/span&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;6. Effect of Interconnect Scaling and Ultra Low k Integration&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;7. Summary&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;Acknowledgments&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;p class=&quot;MsoNormal&quot;&gt;
&lt;strong&gt;&lt;span&gt;References&lt;/span&gt;&lt;/strong&gt;
&lt;/p&gt;
&lt;br class=&quot;clear&quot; /&gt;</description>
 <comments>http://www.imechanica.org/node/2587#comments</comments>
 <category domain="http://www.imechanica.org/taxonomy/term/118">industry</category>
 <category domain="http://www.imechanica.org/taxonomy/term/205">electronic package</category>
 <category domain="http://www.imechanica.org/taxonomy/term/32">fracture mechanics</category>
 <category domain="http://www.imechanica.org/taxonomy/term/164">interconnect</category>
 <category domain="http://www.imechanica.org/taxonomy/term/1615">microelectronics</category>
 <category domain="http://www.imechanica.org/taxonomy/term/220">R. Huang Group Research</category>
 <category domain="http://www.imechanica.org/taxonomy/term/211">reliability</category>
 <enclosure url="http://www.imechanica.org/files/CPI_Review2007.pdf" length="1681503" type="application/pdf" />
 <pubDate>Thu, 17 Jan 2008 21:58:11 -0500</pubDate>
 <dc:creator>Rui Huang</dc:creator>
 <guid isPermaLink="false">2587 at http://www.imechanica.org</guid>
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